Contact Person: David Cameron
Desrcription of Expertise: ASTRaL specialises in thin film deposition by magnetron sputtering and atomic layer deposition (ALD). Sputtering enables micrometere scale (or less) films of a very wide range of solid materials to be deposited on materials on a range of substrates. ALD allows totally conformal sub-micrometer layers and nanolaminates to be deposited. Both can be deposited over a temperature range from several hundred degrees down to room temperature. These materials are being studied as, for example, photocatalytic coatings, diffusion barriers, thermal barriers, biological coatings, wear resistant coatings, adhesion layers, etc. It also has the capability of analysing thin films and surfaces using techniques such as spectroscopic ellipsometry, microRaman spectroscopy, electron microscopy, X-ray spectroscopy, infra red, visible and UV spectroscopy, atomic force microscopy and surface energy analysis.
1.2.1 Magnetron Sputtering 1.2.10 Atomic Layer Deposition (ALD) 1.5.6 Other Surface Functionalization 2.1.1 Scanning Electron Microscopy (SEM) 2.1.4 Atomic Force Microscopy (AFM) 2.1.8 Surface Profilometry 2.3.1 Ellipsometry 2.3.5 UV-vis Spectroscopy 2.4.2 X-ray Analysis (EDS/EDX, WDX, XRF) 2.4.4 Mass Spectrometry (SIMS, ICP-MS, LA-ICP-MS, TOF) 2.5.1 Optical Spectroscopy (IR, FTIR, Raman) 2.5.2 Secondary Ion Mass Spectrometry (SIMS) 2.6.1 Contact Angle measurement 2.8.1 Capacitance Measurements 2.8.5 Hall Measurements 2.9.2 Spectroscopic Ellipsometry (SE, VASE) 2.12.4 Other Reaction Mechanism Studies
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