Electron Gun Evaporator, VARIAN
Sergey Novikov
sergey.novikov(at)tkk.fi
1990
2002
Substrate Size:
100 mm dia. Max. Holders for smaller samples are available.
Allowed Materials:
Metal, oxides
Forbidden Materials:
Elements with the high vapor pressure at the room temperature (Pb,Zn,Cd V-VI group), organic.
Availability and Cost:
Availability Class: F (Use allowed for all researchers with permission.)
Price Category: Moderate
E-beam evaporator for the thin film growth.
• 4 x 4cc crucible places for different materials
• 2 samples holders on the rotated carousel
• Deposition angle adjustment
• Oxygen leak valve for in-situ oxidation
• Crucible to sample distance 170 mm
• Maximum beam current 200 mA