Electron Gun - Resistive Evaporator, EDWARDS
Pasi Kostamo
pasi.kostamo(at)tkk.fi +358947023167
1989
2002
Substrate Size:
50 mm circular wafers max, minimum sample size 1x1mm2.
Allowed Materials:
Substrates: Practically all substrates allowed. (Silicon, GaAs, InP, Glasses)
Forbidden Materials:
Zn, AuZn, Toxic materials, non-cleamroom compatible materials, A permission is required from main user for exotic material.
Availability and Cost:
Availability Class: F
Price Category: Low
Vacuum evaporation system for metal evaporation. 2 E-beam sources and 2 resistive sources available.
2 E-beam sources, 2 resistive sources. Diffusion pump, Rotary pump. E-beam power supply.
Min. pressure 2e-7 mbar
Typical film thicknesses few nm to ~500nm.