SEM Sample Sputter Coater
Antti J. Niskanen
Antti.Niskanen(at)tkk.fi +358-9-470-22319
----
----
Substrate Size:
substrate_size
Allowed Materials:
All vacuum compatible materials
Forbidden Materials:
Dirty, sticky, oily, wet or otherwise vacuum-detrimental samples
Availability and Cost:
Availability Class: F (Use allowed for all researchers with permission.)
Price Category: N/A
System for depositing a thin conductive gold film on a sample prior to SEM examination. Option for carbon deposition (not installed). Process is semi-automatic.
• Contains a single magnetron sputter head with Au foil target
• The process gas is argon
• The system uses a mechanical pump only
• Accessories for carbon deposition are available from the manufacturer.
Target: Gold foil
Process gas: Argon
Typical process pressure: 0.1 mbar
Chamber size Approx: 100 mm diameter, 50 mm high