Name and Model: Axic Multimode HF-8
Contact Person: Ari Halvari ari.halvari@savonia.fi +358 44 785 5579
Year of Manufacture: 2000
Year of Installation: 2005
General Technical Information: System for reactive ion etching.
Desrcription of Use: Fabrication of micro- and nanostructures. Surface cleaning.
Key Features and Accessories: Two massflow controller units. 600 W Power. Auto/manual RF matching. Alcatel Adixen 2033C2 32.5 CFM rotary vane pump. Water cooled HF-8 parallel plate electrodes. Installed into Kojair laminar flow filter fan unit.
Key Specifications: Power source: 600 W 13.56 MHzGases: CF4, SF6, O2, N2, humidity controlled airMasflow controllers: 2x
Photograph:
Location: Savonia University of Applied Sciences, School of Engineering and Technology, Microkatu 1C, FI-70201 Kuopio, Finland
City: Kuopio
Additional information: Available only as a service for short term use. With long term needs call the contact person for more information.
Booking: In case of "as a service", please, call contact person.
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