Name and Model: Karl Suss MA45
Contact Person: Katja Myllymaa +358 44 785 5551
Year of Manufacture: 1996
Year of Installation: 2006
General Technical Information: Exposure system + mask aligner for UV-lithography
Desrcription of Use: Microstructures patterning on UV-lithography photoresists.
Key Features and Accessories: Several custom made sample holders. Proximity modes, soft contact, hard contact. Topside XYZ+angle alignment. 5” maximum mask size. 4” maximum sample size
Key Specifications: UV lamp power: 350 WUV lamp wavelength: 365 – 420 nm
Photograph:
Location: Savonia University of Applied Sciences, School of Engineering and Technology, Microkatu 1C, FI-70201 Kuopio, Finland
City: Kuopio
Additional information: Available with or without operator. Use of the system is easy to learn.
Booking: In case of "as a service", please, call contact person.
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