Name and Model: Torr International E-beam, MagSput, Thermal Evaporator System
Contact Person: Hannu Moilanen
Year of Manufacture: 2006
Year of Installation: 2006
General Technical Information: E-beam evaporation, resistive thermal evaporation and magnetron sputtering system
Desrcription of Use: Thin film deposition
Key Features and Accessories:
Key Specifications:
Vacuum System: Oxford Instruments Austin Scientific cryopump, rotary roughing pump Vacuum Gauge: Varian senTorr with ionization gauge-tube Substrate Stage Size: up to 4” wafer Substrate Heating: Variable temperature quartz lamp heaters with thermocouple Film Thickness Monitor: Sigma SQC-122c thin film deposition controller Gas Delivery System: Ar and N2 with mass flow controller Sputtering Source: 2 fixed mount magnetron guns RF Power Supply: 600W RF power supply 13.56MHz Matching Network: Seren MC2/AT6 automatic matching network Resistive Thermal Source: fixtures for two separate boats, filaments or coils Electron Beam Source: MDC e-Vap 3kW emitter, X-Y sweep controller
Photograph:
Location: University of Oulu, Center of Microscopy and Nanotechnology, Cleanroom
City: Oulu
Additional information: http://www.oulu.fi/nano/
Booking:
Call the contact person for more information
http://www.oulu.fi/nano/
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