Name and Model: UKU 2002
Contact Person: Reijo Lappalainen
Year of Manufacture: 2002-2008
Year of Installation: 2002-2008
General Technical Information:
Desrcription of Use: We have used these facilities mainly for medical applications and research (implants, lithographically paterned samples for cell and bacterials testing etc.), industrial projects related to amorphous diamond and hybrid coatings for wear and corrosion protection as well as several projects related to surface modification and coatings.
Key Features and Accessories: Setup includes several PVD units mounted in a common vacuum deposition chamber. These include plasma beam cleaning, multi unit magnetron sputtering and several pulsed plasma arc discharge units for amorphous diamond and metals.
Key Specifications:
Vacuum chamber: 10-6mbar (base pressure), 10-1-10-5mbar (during deposition)
Photograph:
Location: Dept. of Physics (Panos)
City: Kuopio
Additional information:
Booking:
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