Vacuum Evaporator

Name and Model: UHV (Cryo-torr 8, Telemark TT 10) + Ion Gun (Tectra IonEtch GenII)

Contact Person: Antti Nuottajärvi
nuanka@jyu.fi +358503956002

Year of Manufacture: 1998

Year of Installation: 1998

General Technical Information:

Ultra High Vacuum e-beam evaporator with Ion Gun attached

Desrcription of Use: Thin film deposition of metals. Ion sputtering.

Key Features and Accessories:

e-beam deposition of Au, Ag, Cu, Al, Nb, Ta, Ti. Tunnel junction processing by oxidation between depositions.

Ar ion sputtering of metallic structures and sample cleaning/preparation. Current can be measured while sputtering.

Key Specifications:

TT-271 e-gun with 8 pockets revolver

TT-10 power with acceleration voltage 4-10 kV

Max. current 1 A @ 10 kV

Cryopumped down to 10^-9 mbar

Tectra GenV Ion Gun: Ion energy 25 ev - 5 keV, total beam current 1 mA @ 5 kV (Ar)

Photograph:

Location: University of Jyväskylä, Nanoscience Center, Cleanroom
Survontie 9, 40500 Jyväskylä

City: Jyväskylä