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Atomic Layer Deposition (ALD)

  • 1. Nanofabrication
  • 1.2. Thin film Deposition and Growth
  • 1.2.12. Sol-Gel Deposition
  • 1.2.13. Langmuir-Blodgett (LB)
  • 1.2.1. Magnetron Sputtering
  • 1.2.14. Spin Coating
  • 1.2.2. E-beam Evaporation
  • 1.2.15. Layer-by-Layer Assembly
  • 1.2.3. Thermal Evaporation
  • 1.2.16. Molecular Beam Epitaxy (MBE)
  • 1.2.4. Arc Evaporation
  • 1.2.17. Vapour Phase Epitaxy (VPE)
  • 1.2.5. Pulsed Laser Deposition (PLD) - ablation
  • 1.2.18. Other Thin film Deposition and Growth
  • 1.2.6. Ion Beam Deposition, Ion Beam Sputtering (IBD, IBS)
  • 1.2.7. Chemical Vapour Deposition (CVD)
  • 1.2.8. Plasma Enhanced Chemical Vapour Deposition (PECVD)
  • 1.2.9. Other CVD (HWCVD, LACVD)
  • 1.2.10. Atomic Layer Deposition (ALD)
    • Instruments
    Atomic Layer Deposition (ALD) Reactor - Lappeenranta University of Technology
    Atomic Layer Deposition (ALD) reactors (2) - Aalto University School of Science and Technology (TKK)
    Flow-type ALD reactor - University of Helsinki
    Flow-type ALD reactor (6 reactors) - University of Helsinki

    Expertise
    Thin film deposition and analysis - Lappeenranta University of Technology
    Thin Films and Other Nanostructured Materials - University of Helsinki
  • 1.2.11. Electrodeposition
  • 2. Characterization
  • 3. Computation, Modeling and Simulation
  • 4. Other
MIKTECH OY - Graanintie 5, 50190 Mikkeli FINLAND
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