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» Capability Classification
Focused Ion Beam Milling
1. Nanofabrication
1.1. Nanolithography and Direct Patterning
1.1.1. Photolithography
1.1.2. Electron Beam Lithography (EBL)
1.1.3. Nanoimprint Lithography (NIL)
1.1.4. Laser Interference Lithography (LIL)
1.1.5. Near Field Holography (NFH)
1.1.6. Micro Contact Printing
1.1.7. Focused Ion Beam Milling
Instruments
Focused Ion Beam (FIB) System - University of Oulu
1.1.8. Ion/Electron Beam Assisted Vapor Deposition
1.1.9. Dip Pen Nanolithography
1.1.10. Other Nanolithography and Direct Patterning
2. Characterization
3. Computation, Modeling and Simulation
4. Other
MIKTECH OY - Graanintie 5, 50190 Mikkeli FINLAND
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